| 1. | Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究 |
| 2. | Planar magnetron sputtering system
平面磁控管溅镀系统 |
| 3. | Dc diode sputtering system
直流二极管溅镀系统 |
| 4. | Magnetron sputtering system
磁控管溅镀系统 |
| 5. | Reactive sputtering system
反应性溅镀系统 |
| 6. | Ion beam sputtering system
离子束溅镀系统 |
| 7. | Cu - fe thin films were fabricated by a direction - current ( dc ) magnetron sputtering system
本文首先采用直流磁控溅射镀膜方法制备了cu - fe过饱和固溶体薄膜。 |
| 8. | Compound medium wave - guide film on columned li - ferrites was made by magnetron sputtering system
用磁控溅射的方法在圆柱锂铁氧体表面镀覆了复合介质波导薄膜。 |
| 9. | Boron nitride ( bn ) thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system , with hexagonal boron nitride ( hbn ) target and working gas of argon ( or mixture of nitrogen and argon )
使用射频溅射( rf )系统,靶材为烧结的六角氮化硼( hbn ) ,工作气体为氩气(或氩气和氮气的混合气) ,在硅衬底上沉积氮化硼薄膜。 |
| 10. | Study on the fabricating method the fe / al2o3 / fe mtj and co / al2o3 / feni mtj are prepared by ion - beam sputtering systems . the fexcu ( 1 - x ) granule films were evaporated directly using a high vacuum electron beam evaporation . some samples of granule films are annealed at 340c
用高真空镀膜机制备了fe _ xcu _ ( ( 1 - x ) )系列颗粒膜，并对部分膜做了加热退火处理，样品被加热到340并且保温2小时。 |
